Facilities

The following is a partial list of the equipment we have
Material Growth and Characterization Facility

· Atomic Force Microscope 

We have a Digital Instruments Dimension 3100 atomic force microscope.  This equipment is used to image nanotubes and nanowires on surface.

· Scanning electron Microscope 
This is a JEOL 848 scanning electron microscope.  We have converted this to do e-beam lithography.


 

· Chemical Vapor Deposition Systems for Carbon Nanotube and Nanowire Growth 
We have several chemical vapor deposition systems made of tube furnaces.  We have grown carbon nanotubes and a bunch of nanowires such as CdO, GaN and InN.


 

· Laser ablation System for Nanowire Growth 
We have used this system to grow GaN and In2O3 nanowires.

· RF Sputtering system 

· Thermal Evaporator 

· Dry Box 

· Laurell Spinner 
This is for the e-beam resist spin-on.


 

Other facilities include a THF distillation system, a compact ultra-high-vacuum (UHV) evaporator with liquid nitrogen cooled stage.
 


Measurement And Test Facilities

We have a vast selection of measurement and test facilities.  We have one regular probe station and a variable-temperature probe station.  We have four sets of equipment for high-precision electronic measurements: Agilent 4156B, H/P 4145B, a Keithley 237/2400 combination and a data acquisition system.  We also have two cryostats with base temperatures of 1.2 K and equipped with a 2.6 T magnet.  Purchasing of a cryostat with 8 T magnet is under way.

· Probe Station 
This is a picture of one of our probe stations.

· Low Temperature Probe Station 
This is the continuous flow variable temperature probe station.  This allows us to measure devices in vacuum and also at low temperature without going through the trouble of bonding.

· Agilent 4156: Semiconductor Parameter Analyzer 
This is a picture of the Agilent 4156B.  This equipment has a voltage resolution of 0.1 mV and a current resolution of 1fA.  It’s controlled by a computer for automatic measurements.

· HP 4145B 
HP 4145B has a voltage resolution of 1 mV and a current resolution of 10 fA.  We use 4156B and 4145B extensively for high-precision electronic measurements. 

· Keithley Combo 
This is a picture of our Keithley 2400/237 combo.  A computer is used to control this combo and an oxford temperature controller for automatic measurement.

· Data Acquisition System 
We have a data acquisition system designed to measure Coulomb diamonds at low temperatures.

· Amplifiers
We have all sorts of amplifiers available in our lab such as SRC-850 lock-in amplifiers, current amplifiers from DL Instruments and differential amplifiers from SRC.
· Variable temperature cryostats
Here are pictures of two veriable-temperature cryostats we have.  Both can reach 1.2 K and 2.6 T magnetic field.  One is equipped with microwave capabilities.

                                   
 

· Helium-3 system 
This is under planning.


Facilities Available on Campus

· Clean Room Facilities 
For most of our device fabrication, we use the clean room facilities in the Keck Photonics Center on campus.  There are several Karlsuss mask aligners, a couple of e-beam evaporators for both metals and dielectrics, an RIE/PECVD system, oxidation furnaces, an LPCVD SiN furnace and an converted e-beam lithography facility.  For more information, please go to the Keck Photonics Center website.

· Material Analysis Facilities 
We go to the Microscope Center on campus to perform material analysis.  There are a variety of tools such as scanning electron microscopes, transmission electron microscopes and x-ray diffraction systems.

We have a wide range of facilities which we use in our research.
Some of them are shown here on this page.